Repositorio Institucional de la Universidad de Oviedo

Influence of the hydrogen contained in amorphous silicon thin films on a pulsed radiofrequency argon glow discharge coupled to time of flight mass spectrometry. Comparison with the addition of hydrogen as discharge gas

Author:

Sánchez, Pascal; Alberts, Deborah Viviane M.; Fernández García, Beatriz; Menéndez Estrada, Armando; Pereiro García, María Rosario; Sanz Medel, Alfredo

Publication date:

2012

Publisher version:

http://dx.doi.org/10.1039/c1ja10235d

Citación:

Journal of Analytical Atomic Spectrometry, 27(1), p. 71-79 (2012); doi:10.1039/c1ja10235d

Descripción física:

p. 71-79

URI:

http://hdl.handle.net/10651/8737

ISSN:

0267-9477

Identificador local:

20120019

DOI:

10.1039/c1ja10235d