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Domain nucleation across the metal-insulator transition of self-strained V2 O3 films

Author:
Pofelski, A.; Valencia, S.; Kalcheim, Y.; Salev, P.; Rivera, A.; Huang, C.; Mawass, M. A.; Kronast, F.; Schuller, I. K.; Zhu, Y.; Valle Granda, Javier delUniovi authority
Publication date:
2024
Publisher version:
http://dx.doi.org/10.1103/PhysRevMaterials.8.035003
Citación:
Physical Review Materials, 8(3), (2024); doi:10.1103/PhysRevMaterials.8.035003
URI:
https://hdl.handle.net/10651/75015
ISSN:
2475-9953
DOI:
10.1103/PhysRevMaterials.8.035003
Patrocinado por:

Lab-based XRD measurements were supported by the European Union’s Horizon Europe research and innovation program under Grant Agreement No. 101039986– “Highly Energy-Efficient Resistive Switching in Defect- and Strain- Engineered Mott Insulators for Neuromorphic Computing Applications.” J.d.V. was supported by the Spanish Ministry of Science through a Ramón y Cajal Fellowship (Grant No. RYC2021-030952-I) and by the Asturias FICYT under Grant No. AYUD/2021/51185 with the support of FEDER funds.

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