Endogenous and exogenous hydrogen influence on amorphous silicon thin films analysis by pulsed radiofrequency glow discharge optical emission spectrometry

dc.contributor.author	Sánchez, Pascal
dc.contributor.author	Alberts, Deborah Viviane M.
dc.contributor.author	Fernández García, Beatriz
dc.contributor.author	Menéndez Estrada, Armando
dc.contributor.author	Pereiro García, María Rosario
dc.contributor.author	Sanz Medel, Alfredo
dc.date.accessioned	2013-01-30T10:00:20Z
dc.date.available	2013-01-30T10:00:20Z
dc.date.issued	2011
dc.identifier.citation	Analytica Chimica Acta, 714, p. 1-7 (2011); doi:10.1016/j.aca.2011.11.052	spa
dc.identifier.issn	0003-2670
dc.identifier.uri	http://hdl.handle.net/10651/6875
dc.language.iso	eng
dc.relation.ispartof	Analytica Chimica Acta	spa
dc.source	SCOPUS	spa
dc.title	Endogenous and exogenous hydrogen influence on amorphous silicon thin films analysis by pulsed radiofrequency glow discharge optical emission spectrometry	spa
dc.type	journal article
dc.identifier.local	20111952	spa
dc.identifier.doi	10.1016/j.aca.2011.11.052
dc.relation.publisherversion	http://dx.doi.org/10.1016/j.aca.2011.11.052	spa

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