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Endogenous and exogenous hydrogen influence on amorphous silicon thin films analysis by pulsed radiofrequency glow discharge optical emission spectrometry

dc.contributor.authorSánchez, Pascal 
dc.contributor.authorAlberts, Deborah Viviane M. 
dc.contributor.authorFernández García, Beatriz 
dc.contributor.authorMenéndez Estrada, Armando
dc.contributor.authorPereiro García, María Rosario 
dc.contributor.authorSanz Medel, Alfredo 
dc.date.accessioned2013-01-30T10:00:20Z
dc.date.available2013-01-30T10:00:20Z
dc.date.issued2011
dc.identifier.citationAnalytica Chimica Acta, 714, p. 1-7 (2011); doi:10.1016/j.aca.2011.11.052spa
dc.identifier.issn0003-2670
dc.identifier.urihttp://hdl.handle.net/10651/6875
dc.language.isoeng
dc.relation.ispartofAnalytica Chimica Actaspa
dc.sourceSCOPUSspa
dc.titleEndogenous and exogenous hydrogen influence on amorphous silicon thin films analysis by pulsed radiofrequency glow discharge optical emission spectrometryspa
dc.typejournal article
dc.identifier.local20111952spa
dc.identifier.doi10.1016/j.aca.2011.11.052
dc.relation.publisherversionhttp://dx.doi.org/10.1016/j.aca.2011.11.052spa


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