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Two-step resist deposition of e-beam patterned thick Py nanostructures for X-ray microscopy

dc.contributor.authorHermosa Muñoz, Javier 
dc.contributor.authorHierro Rodríguez, Aurelio 
dc.contributor.authorQuirós Fernández, Carlos 
dc.contributor.authorVélez Fraga, María 
dc.contributor.authorSorrentino, A.
dc.contributor.authorAballe, L.
dc.contributor.authorPereiro, E.
dc.contributor.authorFerrer, S.
dc.contributor.authorMartín Carbajo, José Ignacio 
dc.date.accessioned2022-10-25T11:10:23Z
dc.date.available2022-10-25T11:10:23Z
dc.date.issued2022
dc.identifier.citationMicromachines, 13(2) (2022); doi:10.3390/mi13020204
dc.identifier.issn2072-666X
dc.identifier.urihttp://hdl.handle.net/10651/65129
dc.description.sponsorshipThis research was funded by the Spanish MCI under Project No. PID2019-104604RB/AEI/10.13039/501100011033 and by the Asturias FICYT under grant GRUPIN21 AYUD/2021/51185.
dc.language.isoeng
dc.relation.ispartofMicromachines
dc.rights© 2022 Los autores
dc.rightsCC Reconocimiento 4.0 Internacional
dc.rights.urihttp://creativecommons.org/licenses/by/4.0/
dc.sourceScopus
dc.source.urihttps://www.scopus.com/inward/record.uri?eid=2-s2.0-85124154634&doi=10.3390%2fmi13020204&partnerID=40&md5=e77be6a4b8df6db2598119187c68353d
dc.titleTwo-step resist deposition of e-beam patterned thick Py nanostructures for X-ray microscopy
dc.typeinfo:eu-repo/semantics/article
dc.identifier.doi10.3390/mi13020204
dc.type.dcmitext
dc.relation.projectIDMCI/PID2019-104604RB
dc.relation.projectIDGRUPIN21 AYUD/2021/51185
dc.relation.publisherversionhttp://dx.doi.org/10.3390/mi13020204
dc.rights.accessRightsinfo:eu-repo/semantics/openAccess


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