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Two-step resist deposition of e-beam patterned thick Py nanostructures for X-ray microscopy
| dc.contributor.author | Hermosa Muñoz, Javier | |
| dc.contributor.author | Hierro Rodríguez, Aurelio | |
| dc.contributor.author | Quirós Fernández, Carlos | |
| dc.contributor.author | Vélez Fraga, María | |
| dc.contributor.author | Sorrentino, A. | |
| dc.contributor.author | Aballe, L. | |
| dc.contributor.author | Pereiro, E. | |
| dc.contributor.author | Ferrer, S. | |
| dc.contributor.author | Martín Carbajo, José Ignacio | |
| dc.date.accessioned | 2022-10-25T11:10:23Z | |
| dc.date.available | 2022-10-25T11:10:23Z | |
| dc.date.issued | 2022 | |
| dc.identifier.citation | Micromachines, 13(2) (2022); doi:10.3390/mi13020204 | |
| dc.identifier.issn | 2072-666X | |
| dc.identifier.uri | http://hdl.handle.net/10651/65129 | |
| dc.description.sponsorship | This research was funded by the Spanish MCI under Project No. PID2019-104604RB/AEI/10.13039/501100011033 and by the Asturias FICYT under grant GRUPIN21 AYUD/2021/51185. | |
| dc.language.iso | eng | |
| dc.relation.ispartof | Micromachines | |
| dc.rights | © 2022 Los autores | |
| dc.rights | CC Reconocimiento 4.0 Internacional | |
| dc.rights.uri | http://creativecommons.org/licenses/by/4.0/ | |
| dc.source | Scopus | |
| dc.source.uri | https://www.scopus.com/inward/record.uri?eid=2-s2.0-85124154634&doi=10.3390%2fmi13020204&partnerID=40&md5=e77be6a4b8df6db2598119187c68353d | |
| dc.title | Two-step resist deposition of e-beam patterned thick Py nanostructures for X-ray microscopy | |
| dc.type | journal article | |
| dc.identifier.doi | 10.3390/mi13020204 | |
| dc.relation.projectID | MCI/PID2019-104604RB | |
| dc.relation.projectID | GRUPIN21 AYUD/2021/51185 | |
| dc.relation.publisherversion | http://dx.doi.org/10.3390/mi13020204 | |
| dc.rights.accessRights | open access | |
| dc.type.hasVersion | VoR |
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