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Two-step resist deposition of e-beam patterned thick Py nanostructures for X-ray microscopy

Author:
Hermosa Muñoz, JavierUniovi authority; Hierro Rodríguez, AurelioUniovi authority; Quirós Fernández, CarlosUniovi authority; Vélez Fraga, MaríaUniovi authority; Sorrentino, A.; Aballe, L.; Pereiro, E.; Ferrer, S.; Martín Carbajo, José IgnacioUniovi authority
Publication date:
2022
Publisher version:
http://dx.doi.org/10.3390/mi13020204
Citación:
Micromachines, 13(2) (2022); doi:10.3390/mi13020204
URI:
http://hdl.handle.net/10651/65129
ISSN:
2072-666X
DOI:
10.3390/mi13020204
Patrocinado por:

This research was funded by the Spanish MCI under Project No. PID2019-104604RB/AEI/10.13039/501100011033 and by the Asturias FICYT under grant GRUPIN21 AYUD/2021/51185.

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This item is protected with a Creative Commons License