Resistive switching of vo2 films grown on a thermal insulator

dc.contributor.author	Rischau, C. W.
dc.contributor.author	Gariglio, S.
dc.contributor.author	Triscone, J. M.
dc.contributor.author	Valle Granda, Javier del
dc.date.accessioned	2025-03-14T08:50:46Z
dc.date.available	2025-03-14T08:50:46Z
dc.date.issued	2024
dc.identifier.citation	Physical Review Applied, 22(1), (2024); doi:10.1103/PhysRevApplied.22.014021
dc.identifier.issn	2331-7019
dc.identifier.uri	https://hdl.handle.net/10651/77585
dc.description.sponsorship	U.S. Office of Naval Research through the NICOP Grant [N62909-21-1-2028]; Swiss National Science Foundation through an Ambizione Fellowship [PZ00P2_185848]; Spanish Ministry of Science through a Ramon y Cajal Fellowship [RYC2021-030952-I]; Asturias FICYT [AYUD/2021/51185]; FEDER funds; Swiss National Science Foundation (SNF) [PZ00P2_185848] Funding Source: Swiss National Science Foundation (SNF)
dc.language.iso	eng
dc.relation.ispartof	Physical Review Applied
dc.rights	©,
dc.source	Scopus
dc.source.uri	https://www.scopus.com/inward/record.uri?eid=2-s2.0-85198579801&doi=10.1103%2fPhysRevApplied.22.014021&partnerID=40&md5=63ee8be0c4157ebb4845fcc22f95d568
dc.title	Resistive switching of vo2 films grown on a thermal insulator
dc.type	journal article
dc.identifier.doi	10.1103/PhysRevApplied.22.014021
dc.relation.publisherversion	http://dx.doi.org/10.1103/PhysRevApplied.22.014021

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