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Direct chemical in-depth profile analysis and thickness quantification of nanometer multilayers using pulsed-rf-GD-TOFMS
dc.contributor.author | Valledor González, Rebeca | |
dc.contributor.author | Pisonero Castro, Jorge | |
dc.contributor.author | Bordel García, Nerea | |
dc.contributor.author | Martín Carbajo, José Ignacio | |
dc.contributor.author | Quirós Fernández, Carlos | |
dc.contributor.author | Tempez, Agnès | |
dc.contributor.author | Sanz Medel, Alfredo | |
dc.date.accessioned | 2013-01-30T10:17:22Z | |
dc.date.available | 2013-01-30T10:17:22Z | |
dc.date.issued | 2010 | |
dc.identifier.citation | Analytical and Bioanalytical Chemistry, 396(8), p. 2881-2887 (2010); doi:10.1007/s00216-009-3382-8 | spa |
dc.identifier.issn | 1618-2642 | |
dc.identifier.uri | http://hdl.handle.net/10651/10154 | |
dc.description.abstract | Nanometer depth resolution is investigated using an innovative pulsed-radiofrequency glow discharge timeof- flight mass spectrometer (pulsed-rf-GD-TOFMS). A series of ultra-thin (in nanometers approximately) Al/Nb bilayers, deposited on Si wafers by dc-magnetron sputtering, is analyzed. An Al layer is first deposited on the Si substrate with controlled and different values of the layer thickness, tAl. Samples with tAl=50, 20, 5, 2, and 1 nm have been prepared. Then, a Nb layer is deposited on top of the Al one, with a thickness tNb=50 nm that is kept constant along the whole series. Qualitative depth profiles of those layered sandwich-type samples are determined using our pulsed-rf-GD-TOFMS set-up, which demonstrated to be able to detect and measure ultra-thin layers (even of 1 nm). Moreover, Gaussian fitting of the internal Al layer depth profile is used here to obtain a calibration curve, allowing thickness estimation of such nanometer layers. In addition, the useful yield (estimation of the number of detected ions per sputtered atom) of the employed pulsed-rf-GD-TOFMS system is evaluated for Al at the selected operating conditions, which are optimized for the in-depth profile analysis with high depth resolution. | spa |
dc.format.extent | p. 2881-2887 | spa |
dc.language.iso | eng | |
dc.relation.ispartof | Analytical and Bioanalytical Chemistry | spa |
dc.rights | (c) Analytical and Bioanalytical Chemistry | |
dc.source | WOK | spa |
dc.subject | Glow Discharge . Mass Spectrometry . Depth Profile Analysis . Nanometer Layers . Useful Yield | spa |
dc.title | Direct chemical in-depth profile analysis and thickness quantification of nanometer multilayers using pulsed-rf-GD-TOFMS | spa |
dc.type | journal article | |
dc.identifier.local | 20100674 | spa |
dc.identifier.doi | 10.1007/s00216-009-3382-8 | |
dc.relation.publisherversion | http://dx.doi.org/10.1007/s00216-009-3382-8 | spa |
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