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Repositorio de la Universidad de Oviedo. > Producción Bibliográfica de UniOvi: RECOPILA > Artículos >

Please use this identifier to cite or link to this item: http://hdl.handle.net/10651/8737

Title: Influence of the hydrogen contained in amorphous silicon thin films on a pulsed radiofrequency argon glow discharge coupled to time of flight mass spectrometry. Comparison with the addition of hydrogen as discharge gas
Author(s): Sánchez, Pascal
Alberts, Deborah Viviane M.
Fernández García, Beatriz
Menéndez Estrada, Armando
Pereiro García, María Rosario
Sanz Medel, Alfredo
Issue date: 2012
Publisher version: http://dx.doi.org/10.1039/c1ja10235d
Citation: Journal of Analytical Atomic Spectrometry, 27(1), p. 71-79 (2012); doi:10.1039/c1ja10235d
Format extent: p. 71-79
URI: http://hdl.handle.net/10651/8737
ISSN: 0267-9477
Local identifier: 20120019
Appears in Collections:Artículos

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