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Please use this identifier to cite or link to this item: http://hdl.handle.net/10651/7807

Title: Radiofrequency glow discharge time of flight mass spectrometry for thin films analysis: Pulsed mode versus continuous mode
Author(s): Bordel García, Nerea
Lobo Revilla, Lara
Pisonero Castro, Jorge
Pereiro García, María Rosario
Tuccitto, Nunzio
Licciardello, Antonino
Tempez, Agnès
Chapon, Patrick
Hohl, Markus
Michler, Johann
Sanz Medel, Alfredo
Keywords: Continuous Mode; Pulse Mode; Radiofrequency Glow Discharge; Thin Film; Time of Flight Mass Spectrometry
Issue date: 2009
Citation: Yejin Fenxi/Metallurgical Analysis, 29(11), p. 1-7 (2009)
Format extent: p. 1-7
Abstract: Direct surface and depth profiling chemical analysis of advanced multilayer materials demands "multi-dimensional" knowledge, including simultaneous elemental and molecular information. Pulsed radiofrequency glow discharges (pulsed rf-GDs) with detection by time of flight mass spectrometry (TOFMS) provide direct chemical information from a great variety of materials in a fast and easy way. On the other hand, the temporal distribution of the applied power in pulsed rf-GDs produces three main regimes in the discharge (prepeak, plateau and afterpeak) with different mechanisms of ionization. As a result, the quasi-simultaneous acquisition of elemental and molecular ions (at the different pulse regimes) becomes a real possibility when coupling the GD ion source to a fast TOF mass spectrometer.
URI: http://hdl.handle.net/10651/7807
ISSN: 1000-7571
Local identifier: 20090186
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