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Repositorio de la Universidad de Oviedo. > Producción Bibliográfica de UniOvi: RECOPILA > Artículos >

Please use this identifier to cite or link to this item: http://hdl.handle.net/10651/6875

Title: Endogenous and exogenous hydrogen influence on amorphous silicon thin films analysis by pulsed radiofrequency glow discharge optical emission spectrometry
Author(s): Sánchez, Pascal
Alberts, Deborah Viviane M.
Fernández García, Beatriz
Menéndez Estrada, Armando
Pereiro García, María Rosario
Sanz Medel, Alfredo
Issue date: 2011
Publisher version: http://dx.doi.org/10.1016/j.aca.2011.11.052
Citation: Analytica Chimica Acta, 714, p. 1-7 (2011); doi:10.1016/j.aca.2011.11.052
URI: http://hdl.handle.net/10651/6875
ISSN: 0003-2670
Local identifier: 20111952
Appears in Collections:Artículos

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